EQUIPMENT

EUV lithography

EUV lithography transfers patterns using light with a wavelength of 13.5 nm. EUV systems print selected intricate layers; DUV systems remain part of the same manufacturing flow. Light wavelength should not be confused with a process node label or the final printed feature size.

EUVextreme ultraviolet극자외선lithography

Specifications

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Light wavelength	Manufacturer / primary sourceASML Scope: concept
Complementary technology	Manufacturer / primary sourceASML Scope: concept

THE VISUAL EVIDENCE

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Referenced by · patterned bySilicon waferwafer

Lithography projects patterns onto a wafer; use of EUV is process-specific.

ASML · Evidence

Sources and historical context

EUV lithography systems

ASML · official-disclosure · primary source verified