VLSI Korea
⌘ K
SEMICONDUCTOR REFERENCE

ASML

Find products, devices, processes and manufacturing tools with specifications and original sources.

Specification query syntax

Use cores, threads, clock, boost, l2, l3, tdp, memory or year with =, >=, <=, > or <. Units: GHz, MB, W, GB. Unknown or conflicting values do not match numeric conditions.

Results

2 records

equipment

Capabilities apply to the named tool or family and the source’s configuration. Vendor throughput is not an independent benchmark. Missing fields are unresearched; conflicting observations remain visible.
CompareTool / familyProcess applicationTechnology / methodWafer / substrateCapability
EUV lithographyASML · concept
unresearchedunresearchedunresearchedunresearched

lithography

Capabilities apply to the named tool or family and the source’s configuration. Vendor throughput is not an independent benchmark. Missing fields are unresearched; conflicting observations remain visible.
CompareTool / familyProcess applicationTechnology / methodWafer / substrateCapability
ASML TWINSCAN NXE:3600DASML · tool model
300 mm EUV exposureProcess applicationunresearchedunresearched0.33 NAProjection numerical aperture