SEMICONDUCTOR REFERENCE

반도체 컬렉션 탐색

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4 개 기록정렬

process

Vendor PPA claims retain their own reference process and conditions. Node labels are not physical gate dimensions. Missing fields are unresearched; conflicting observations remain visible.
Compare	Entity	Transistor integration	Performance claim	Power claim	Density definition	PPA baseline
	TSMC N7TSMC · process variant	unresearched	unresearched	unresearched	unresearched	unresearched
	Intel 14 nm (2014 disclosure)Intel · process variant · 2014	Second-generation tri-gate (FinFET)Transistor structure	unresearched	unresearched	unresearched	unresearched
	TSMC N2TSMC · process variant	NanosheetTransistor architecture	10–15 %Performance improvement	25–30 %Power reduction	not found	TSMC N3 (2022 disclosure)PPA baseline
	Samsung SF2Samsung · process variant	GAATransistor architecture	12 %Performance improvement	25 %Power efficiency improvement	unresearched	Samsung SF3 (2023 disclosure)PPA baseline

Samsung SF2 / TSMC N2 — PPA와 기준 조건